HIT Devices - Erase Head for Rewritable Printer

Development of method to granulate polymerized acrylic resin	1955
Quality Kaizen of carbon-film resistors	1959
Launching metal-film resistor manufacturing line	1963
Launching silicon wafer fab	1967
Development/mass-production of transistors/diode/photo-transistors	1968
Launching GaAsP LED wafer fab	1972
Development/mass-production of LED display for hand-held calculator	1973
Development/mass-production of thermal printhead with thick-film technology *	1974
Launching thick-film fax printhead mass-production	1977
Development/mass-production of thermal printhead with partial glaze layer *	1978
Development/implementation of dedicated driver IC on substrate for thermal printhead *	1979
Development and launching LED printhead mass-production	1987
Development of 2" erase head for rewritable recording media	2002
Development of 4" erase head with sub-heater for rewritable recording media and thermal double transfer applications	2004
Development of 6" large-size erase head for rewritable recording media	2005
New 8-inch model erase head for rewritable recording media developed	2007
* Technology still widely used in the industry today.

1. Company History
September 2001: Laboratory HIT Research was founded and erase head
development started.
September 2002: Limited Private Company HIT Devices was established
to prepare for mass production.
January 2004: Incorporated as HIT Devices Ltd. and domestic & overseas
sales network was setup.

2. Company Description
Name: HIT Devices Ltd.
President: Hideo Taniguchi
Capital: 10 Million Yen

3. Research & Development Areas (Including joint research)
Printer related : Various type printhead / Image forming technology development
Display related : Rewritable media application products
MEMS/Nano related : Nano-ink application / Microscopic image forming technology
and application

4. President's Carrier Summary

Mitsubishi Rayon Company	1954 - 1955
Rohm Co., Ltd.	1957 - 1999
HIT Devices Ltd related	2001 -